Author: Aye Su Mon Win1, Nilar Win1, Than Than Win2, Than Htoon3 ,Yin Maung Maung4 and Ko Ko Kyaw Soe5
Abstract:
Fabrication of PST gated TFT was performed on P2O5 substituted SiO2/p-Si substrate structure. Drain characteristics of these TFT's were observed. According to the experimental results, the fabricated TFT was applied for 1T of FRAM.
Key words : thin film transistor, drain characteristics
Published: Published: Myanmar Academy of Arts and Science Research Journal (Vol.VI,No-2(B), March 2008, Physics)
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